What is the mechanism of doping and how does it relate to semiconductors?

Doping is the process of intentionally adding impurities to a semiconductor to alter its electrical properties.

Semiconductors are materials that have electrical conductivity between that of a conductor and an insulator. They are widely used in electronic devices such as transistors, diodes, and solar cells. Doping is a crucial process in semiconductor manufacturing, as it allows for the creation of p-type and n-type semiconductors.

P-type semiconductors are created by adding impurities such as boron or aluminium to a pure semiconductor such as silicon. These impurities have one less valence electron than the semiconductor atoms, creating "holes" in the crystal lattice where electrons are missing. These holes act as positive charge carriers, allowing the material to conduct electricity.

N-type semiconductors are created by adding impurities such as phosphorus or arsenic, which have one more valence electron than the semiconductor atoms. These extra electrons become free to move through the crystal lattice, creating negative charge carriers and increasing the material's conductivity.

Doping is a precise process, as the amount and type of impurities added can greatly affect the electrical properties of the semiconductor. By carefully controlling the doping process, manufacturers can create semiconductors with specific electrical properties for use in a wide range of electronic devices.